Sidewall angle tuning in focused electron beam-induced processing

• Sangeetha Hari,
• Willem F. van Dorp,
• Johannes J. L. Mulders,
• Piet H. F. Trompenaars,
• Pieter Kruit and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 447–456, doi:10.3762/bjnano.15.40

• ; FEBIP; side wall angle; Introduction Focused electron beam-induced processing (FEBIP) is a technique in which a focused electron beam is directed onto a substrate with an adsorbed layer of precursor molecules. The precursor molecules are supplied from a gas injection system through a nozzle at close

A combined gas-phase dissociative ionization, dissociative electron attachment and deposition study on the potential FEBID precursor [Au(CH₃)₂Cl]₂

• Elif Bilgilisoy,
• Ali Kamali,
• Thomas Xaver Gentner,
• Gerd Ballmann,
• Sjoerd Harder,
• Hans-Peter Steinrück,
• Hubertus Marbach and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2023, 14, 1178–1199, doi:10.3762/bjnano.14.98

Chemical vapor deposition of germanium-rich CrGe_x nanowires

• Vladislav Dřínek,
• Stanislav Tiagulskyi,
• Roman Yatskiv,
• Jan Grym,
• Radek Fajgar,
• Věra Jandová,
• Martin Koštejn and
• Jaroslav Kupčík

Beilstein J. Nanotechnol. 2021, 12, 1365–1371, doi:10.3762/bjnano.12.100

• with the Ga+ focused ion beam (FIB), gas injection system (GIS), and nanomanipulator OmniProbe 400 (Oxford Instruments) with a tungsten tip. The nanomanipulator enabled a direct contact of single as-grown NWs. The current–voltage (I–V) characteristics were measured using a Keithley 237 source

Irradiation-driven molecular dynamics simulation of the FEBID process for Pt(PF₃)₄

• Alexey Prosvetov,
• Alexey V. Verkhovtsev,
• Gennady Sushko and
• Andrey V. Solov’yov

Beilstein J. Nanotechnol. 2021, 12, 1151–1172, doi:10.3762/bjnano.12.86

• selected. These values correspond to positions of the peaks in the experimentally measured electron energy loss spectra for Pt(PF3)4 [26]. Step 3. Initial state of the system In FEBID experiments precursor molecules are delivered through the gas injection system and fill the scanning electron microscope

Electron beam-induced deposition of platinum from Pt(CO)₂Cl₂ and Pt(CO)₂Br₂

• Aya Mahgoub,
• Hang Lu,
• Rachel M. Thorman,
• Konstantin Preradovic,
• Titel Jurca,
• Lisa McElwee-White,
• Howard Fairbrother and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2020, 11, 1789–1800, doi:10.3762/bjnano.11.161

• [17]. The typical issues to be addressed when testing novel precursors include: (i) precursor storage, (ii) gas injection system (GIS) loading, (iii) optimal precursor temperature for deposition, (iv) precursor volatility and transport from the SEM chamber, (v) ability of precursor to form solid

3D superconducting hollow nanowires with tailored diameters grown by focused He⁺ beam direct writing

• Rosa Córdoba,
• Alfonso Ibarra,
• Dominique Mailly,
• Isabel Guillamón,
• Hermann Suderow and
• José María De Teresa

Beilstein J. Nanotechnol. 2020, 11, 1198–1206, doi:10.3762/bjnano.11.104

• Growth of 3D hollow WC nanowires He+ FIBID hollow WC NWs have been fabricated in a ZEISS ORION NanoFab instrument equipped with a helium ion beam column and a single-needle gas injection system (GIS) through which W(CO)6 gas is delivered to the process chamber. The NWs were deposited on top of the pre

Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition

• Lukas Keller and
• Michael Huth

Beilstein J. Nanotechnol. 2018, 9, 2581–2598, doi:10.3762/bjnano.9.240

• other kind of solid support, is placed inside a scanning electron microscope (SEM). A precursor gas is supplied in close proximity to the focus of the primary electron beam. This is typically done by employing a gas injection system (GIS). The precursor molecules adsorb and diffuse on the substrate

• - and precursor-specific parameters which depend also on the beam parameters (energy and current), and information about the geometry of the gas injection system (e.g., azimuthal and polar angles). All input and output files of the pattern generator program are explained in detail in the Supporting

Chemistry for electron-induced nanofabrication

• Petra Swiderek,
• Hubertus Marbach and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2018, 9, 1317–1320, doi:10.3762/bjnano.9.124

• surface and are decomposed under the tightly focused electron beam to yield a solid deposit. The precursor consists of elements that are desired in the deposit and of ligands which provide the molecules with sufficient volatility to be handled via a gas injection system. Ideally, the precursor molecule

A novel copper precursor for electron beam induced deposition

• Caspar Haverkamp,
• George Sarau,
• Mikhail N. Polyakov,
• Ivo Utke,
• Marcos V. Puydinger dos Santos,
• Silke Christiansen and
• Katja Höflich

Beilstein J. Nanotechnol. 2018, 9, 1220–1227, doi:10.3762/bjnano.9.113

• , equipped with a gas injection system designed by modular flow [25] and assembled by Kammrath and Weiß. The GIS reservoir was manually filled before each deposition. The reservoir and needle were separately heated to 100 °C for the reservoir and to 105 °C for the needle. The GIS needle opening was adjusted

Towards the third dimension in direct electron beam writing of silver

• Katja Höflich,
• Jakub Mateusz Jurczyk,
• Katarzyna Madajska,
• Maximilian Götz,
• Luisa Berger,
• Carlos Guerra-Nuñez,
• Caspar Haverkamp,
• Iwona Szymanska and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 842–849, doi:10.3762/bjnano.9.78

• fully integrated custom-built gas-injection system (GIS). The GIS was designed for short molecule paths and chemical inertness to allow for the evaporation of highly reactive compounds with low vapor pressure. The GIS three-axis stage allowed for accurate positioning of the nozzle exit 200 µm above the

• the integration of the gas-injection system into a field-emitter electron microscope to achieve sub-100 nm resolution as typically needed for plasmonic structures [17]. Scanning electron micrographs of deposits from (a, e) AgO2Me2Bu and (b, f) AgO2F5Prop using a beam current of 500 pA. (c) The deposit

Electron interactions with the heteronuclear carbonyl precursor H₂FeRu₃(CO)₁₃ and comparison with HFeCo₃(CO)₁₂: from fundamental gas phase and surface science studies to focused electron beam induced deposition

• Ragesh Kumar T P,
• Paul Weirich,
• Lukas Hrachowina,
• Marc Hanefeld,
• Ragnar Bjornsson,
• Helgi Rafn Hrodmarsson,
• Sven Barth,
• D. Howard Fairbrother,
• Michael Huth and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2018, 9, 555–579, doi:10.3762/bjnano.9.53

Gas-assisted silver deposition with a focused electron beam

• Luisa Berger,
• Katarzyna Madajska,
• Iwona B. Szymanska,
• Katja Höflich,
• Mikhail N. Polyakov,
• Jakub Jurczyk,
• Carlos Guerra-Nuñez and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 224–232, doi:10.3762/bjnano.9.24

• organic precursors are introduced with a gas injection system (GIS) and physisorb onto the substrate. The electrons induce local precursor dissociation on the surface, which in the ideal case results in a selective and pure metal deposit and volatile organic ligands. However, the organic ligand elements

• mode of the Hitachi S3600 software was used. The precursor was introduced into the chamber via a homebuilt gas injection system (GIS). The GIS was made of chemically inert stainless steel and designed to minimize the molecule path lengths. Instead of a capillary, a large GIS-opening of 3 mm inner

• (version 1.2.0). Results and Discussion The depositions were conducted at substrate temperatures of 160 °C. In contrast to typical FEBID experiments, the gas injection system (GIS) had to be heated to 175 °C. The high GIS temperatures assured sufficient evaporation of the carboxylate compound, while the

Comparative study of post-growth annealing of Cu(hfac)₂, Co₂(CO)₈ and Me₂Au(acac) metal precursors deposited by FEBID

• Marcos V. Puydinger dos Santos,
• Aleksandra Szkudlarek,
• Artur Rydosz,
• Carlos Guerra-Nuñez,
• Fanny Béron,
• Kleber R. Pirota,
• Stanislav Moshkalev,
• José Alexandre Diniz and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 91–101, doi:10.3762/bjnano.9.11

• deposition mechanism consists of the delivery of gas molecules into a scanning electron microscope (SEM) chamber by a gas injection system (GIS), and the subsequent reversible physiosorption of these molecules on the substrate surface. Part of the energy, from both the primary electron beam and the secondary

The rational design of a Au(I) precursor for focused electron beam induced deposition

• Ali Marashdeh,
• Thiadrik Tiesma,
• Niels J. C. van Velzen,
• Sjoerd Harder,
• Remco W. A. Havenith,
• Jeff T. M. De Hosson and
• Willem F. van Dorp

Beilstein J. Nanotechnol. 2017, 8, 2753–2765, doi:10.3762/bjnano.8.274

• through a gas injection system. The precursor molecules adsorb on the sample surface, and locally, where the beam interacts with the sample, electrons induce the scission of bonds in the precursor molecules [6]. Figure 1a shows the deposition process. The cartoon in Figure 1b and the corresponding

• reservoir or the Al crucible of an FEI gas injection system (GIS) in Ar or N2 atmosphere. Electron microscopy Crystals of ClAuCO, ClAuPMe3, ClAuPEt3 and MeAuPMe3 were inserted in the sample chamber of a Philips XL30 environmental scanning electron microscope (SEM), equipped with a field-emission gun and an

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

• Domagoj Belić,
• Mostafa M. Shawrav,
• Emmerich Bertagnolli and
• Heinz D. Wanzenboeck

Beilstein J. Nanotechnol. 2017, 8, 2530–2543, doi:10.3762/bjnano.8.253

• introduced into the high-vacuum chamber of a custom-modified SEM via home-built gas injection system (GIS) [42], in such a way that a nozzle was brought into close vicinity (≈200 μm) of the intended deposition spot on a prepared p-type Si substrate. When a beam of primary electrons impacts on the surface

• functionalization, which is highly desired for a range of applications in nanotechnology. Experimental The samples were prepared by FEBID of Au inside a custom-modified Zeiss Leo 1530VP SEM. The microscope was equipped with a home-made gas injection system containing dimethylgold(III)-trifluoroacetylacetonate

Comparing postdeposition reactions of electrons and radicals with Pt nanostructures created by focused electron beam induced deposition

• Julie A. Spencer,
• Michael Barclay,
• Miranda J. Gallagher,
• Robert Winkler,
• Ilyas Unlu,
• Yung-Chien Wu,
• Harald Plank,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2017, 8, 2410–2424, doi:10.3762/bjnano.8.240

• , The Netherlands) using a standard FEI gas injection system for delivering MeCpPtMe3. The precursor was heated to 45 °C for at least 2 h and the gas valve was opened at least 3 min prior to the deposition. Nine 5 × 5 µm2 Pt–C pads were deposited at a primary energy of 5 keV and a beam current of 1600

Magnetic properties of optimized cobalt nanospheres grown by focused electron beam induced deposition (FEBID) on cantilever tips

• Soraya Sangiao,
• César Magén,
• Darius Mofakhami,
• Grégoire de Loubens and
• José María De Teresa

Beilstein J. Nanotechnol. 2017, 8, 2106–2115, doi:10.3762/bjnano.8.210

• content in order to present high saturation magnetization. Results and Discussion Sample growth and characterization In FEBID, the precursor gas molecules are delivered onto the substrate surface by means of a nearby gas-injection system and the focused electron beam is scanned on the surface. The

3D Nanoprinting via laser-assisted electron beam induced deposition: growth kinetics, enhanced purity, and electrical resistivity

• Brett B. Lewis,
• Robert Winkler,
• Xiahan Sang,
• Pushpa R. Pudasaini,
• Michael G. Stanford,
• Harald Plank,
• Raymond R. Unocic,
• Jason D. Fowlkes and
• Philip D. Rack

Beilstein J. Nanotechnol. 2017, 8, 801–812, doi:10.3762/bjnano.8.83

• . This system was mounted on an FEI Novalab 600 chamber port oriented at 52° with respect to the silicon substrate plane. Additional information on the laser system can be found in [59]. Gas injection system An FEI gas injector was used to deliver the MeCpPt(IV)Me3 precursor close to the substrate

Thickness-modulated tungsten–carbon superconducting nanostructures grown by focused ion beam induced deposition for vortex pinning up to high magnetic fields

• Ismael García Serrano,
• Javier Sesé,
• Isabel Guillamón,
• Hermann Suderow,
• Sebastián Vieira,
• Manuel Ricardo Ibarra and
• José María De Teresa

Beilstein J. Nanotechnol. 2016, 7, 1698–1708, doi:10.3762/bjnano.7.162

• -injection system for the W(CO)6 precursor. The precursor gas is spread locally onto the substrate, where it becomes dissociated by the FIB. The composition of flat deposits has been previously studied with X-ray photoelectron spectroscopy [13], giving as a result (in atom %), W (40%), C (43%), Ga (10%) and

• in the present work from 60 to 140 nm, which allows us to determine the effect of its commensurability with the intervortex distance. The W–C deposits have been grown by FIBID inside commercial Helios 650 dual-beam equipment from FEI, which includes a Ga+ FIB column. The equipment includes a gas

The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

• Rachel M. Thorman,
• Ragesh Kumar T. P.,
• D. Howard Fairbrother and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2015, 6, 1904–1926, doi:10.3762/bjnano.6.194

Focused particle beam-induced processing

• Michael Huth and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2015, 6, 1883–1885, doi:10.3762/bjnano.6.191

• breadth of its application fields over the last 10 years. In FEBID, a highly focused electron beam, in most cases provided by a scanning electron microscope, is raster-scanned over a substrate surface on which an adsorbed precursor layer is sustained by a precursor gas injection system. As the primary (as

Continuum models of focused electron beam induced processing

• Milos Toth,
• Charlene Lobo,
• Vinzenz Friedli,
• Aleksandra Szkudlarek and
• Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1518–1540, doi:10.3762/bjnano.6.157

• continuum FEBIP models. Keywords: continuum model; deposition; electron beam processing; etching; gas injection system; Review Introduction to continuum models of focused electron beam induced processing (FEBIP) Continuum FEBIP models enable the simulation of process rates that govern focused electron

• produced by a capillary-style gas injection system. We then cover simple continuum models that are valid in the reaction rate limited regime (where net adsorbate transport via surface diffusion is negligible) and can be used to model FEBIP performed using continuous and pulsed electron beams, physisorbed

• contributions from primary, backscattered and secondary electrons, each of which has a unique spatial profile and a unique energy distribution [19]. Gas flow from a capillary-style gas injection system (GIS) FEBIP precursor gases are injected into a specimen chamber using one of two methods. In the first method

Formation of pure Cu nanocrystals upon post-growth annealing of Cu–C material obtained from focused electron beam induced deposition: comparison of different methods

• Aleksandra Szkudlarek,
• Alfredo Rodrigues Vaz,
• Yucheng Zhang,
• Andrzej Rudkowski,
• Czesław Kapusta,
• Rolf Erni,
• Stanislav Moshkalev and
• Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1508–1517, doi:10.3762/bjnano.6.156

• nanolithography technique, based on the local dissociation of adsorbates upon the irradiation with electrons [1]. The molecules are delivered into the microscope chamber by a gas injection system (GIS) where they reversibly physisorb onto the substrate surface. Part of the energy from the primary electron beam or

Influence of the shape and surface oxidation in the magnetization reversal of thin iron nanowires grown by focused electron beam induced deposition

• Luis A. Rodríguez,
• Lorenz Deen,
• Rosa Córdoba,
• César Magén,
• Etienne Snoeck,
• Bert Koopmans and
• José M. De Teresa

Beilstein J. Nanotechnol. 2015, 6, 1319–1331, doi:10.3762/bjnano.6.136

• exciting research topic [1][2]. In this technique, a scanning electron microscope (SEM) dissociates the precursor molecules delivered into the area of interest by a gas-injection system, producing a deposit [3][4][5][6]. The use of precursor molecules containing cobalt [7][8][9][10] or iron [11][12][13][14

• substrates inside an FEI Helios 600 apparatus, using Fe2(CO)9 as precursor and the scanning electron microscope (SEM) to produce magnetic deposits in a single step, as sketched in Figure 1a. The precursor is delivered to the area of interest through a single gas-injection-system (GIS) with inner diameter of

Structural transitions in electron beam deposited Co–carbonyl suspended nanowires at high electrical current densities

• Gian Carlo Gazzadi and
• Stefano Frabboni

Beilstein J. Nanotechnol. 2015, 6, 1298–1305, doi:10.3762/bjnano.6.134

• scanning electron microscopes (SEM) by installing a gas injection system (GIS). FEBID flexibility has been exploited in applications that are critical for traditional lithography techniques, such as the deposition of electrical connections to isolated nanostructures [3][4] or the fabrication of scanning